An expert in the field, he discussed how the method could be used to measure the gap between a showerhead and a plasma-enhanced chemical vapour deposition and improve first pass film checks by up to 24 per cent.
Mr Ramsey also spoke about reducing manufacturing expenses and ways of increasing productivity with the attendees of the 6th annual symposium.
He stated that there may be better alternatives to the legacy method.
"When you walk through the steps of the legacy gapping method, you really see the extra work and challenges the instruments present," Mr Ramsey added.
In other manufacturing news, Cadence Design Systems revealed last week that it will be delivering a new low-power flow that could result in the faster design of leading-edge, low-power semiconductors.
